Nanofabrication Technology
Academic Study Board of the Faculty of Engineering
Teaching language: English
EKA: T350021402
Censorship: Second examiner: Internal
Grading: 7-point grading scale
Offered in: Soenderborg
Offered in: Spring
Level: Master
Course ID: T350021401
ECTS value: 5
Date of Approval: 31-08-2018
Duration: 1 semester
Version: Archive
Course ID
Course Title
ECTS value
5
Internal Course Code
Responsible study board
Administrative Unit
Date of Approval
Course Responsible
Teachers
Programme Secretary
Offered in
Level
Offered in
Duration
Recommended prerequisites
Learning objectives - Knowledge
- The knowledge of the applications area that require the use of nanofabrication technology
•The knowledge of electron beam lithography (EBL) and of the steps in an EBL process
•The knowledge of the nanoimprint lithography and focused ion beam and their pros and cons
•The knowledge of the working principle and pros and cons of the most common bottom-up patterning techniques.
Learning objectives - Skills
•The ability to optimize the pattern/pattern writing in NIL and FIB to minimize the potential artefacts inherent with these techniques
•The ability to design a dose pattern for EBL that includes proximity effect correction and fabricate a nanoscale pattern based on this design.
Learning objectives - Competences
•The ability to select the relevant nanofabrication techniques for a given application
•The ability to optimize process parameters in a systematic way
•The ability to work independently with electron beam lithography processing.
Content
In many applications, materials need to be structured on a nanoscopic scale. These include e.g. nanoelectronics, nanooptics, nanomechanics, nanofluidics etc. This is often accomplished using some form of nanolithography technique. The aim of this course, which builds on the knowledge, skills, and competences obtained in MCMICRO1, is to make the students able to design and fabricate nanostructures using the most common nanofabrication techniques.
The specific topics are:
- Introduction to nanofabrication and related application areas
•Nanoelectronics
•Nanooptics
•Nanomechanics
•Nanofluidics
- Top-down patterning techniques
•Electron beam lithography (incl. exercise designing and fabricating EBL pattern)
•Nanoimprint lithography (NIL)
•Focused ion beam (FIB)
•Nanostenciling
- Bottom-up patterning techniques
•Nanosphere lithography
•Self-assembled monolayers
•Porous alumina templates
•Block co-polymer lithography.
URL for Skemaplan
Teaching Method
Number of lessons
48 hours per semester
Teaching language
Examination regulations
Exam regulations
Name
Exam regulations
Examination is held
End of Semester.
Tests
EXAM
EKA
T350021402
Name
EXAM
Description
The individual laboratory excercises handed in by the student during the semester, will be included in the assessment.
Individually graded according to the Danish 7-point grading scale.
Form of examination
Oral examination
Censorship
Second examiner: Internal
Grading
7-point grading scale
Identification
Student Identification Card - Exam number
Language
English
ECTS value
5
Courses offered
| Offer period | Offer type | Profile | Education | Semester |
|---|---|---|---|---|
| Spring 2019 | Mandatory | Physics and Technology | Master of Science in Engineering (Physics and Technology) | Odense | 2 |
Studieforløb
| Profile | Education | Semester | Offer period |
|---|---|---|---|
| Physics and Technology | Master of Science in Engineering (Physics and Technology) | Odense | 2 | F19 |